Plasma chemistry and plasma processing -Impact Score, Ranking
Plasma chemistry and plasma processing ranking| Journal Rank | 8958 |
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| Impact Score | 3.77 |
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| H-Index | 72 |
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| SJR | 0.577 |
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About Plasma chemistry and plasma processing
Plasma chemistry and plasma processing is a reputed research journal publish the research in the field/area related to
Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2). It is
published by
Springer New York. The journal has an h-index of 72. The
overall rank of this journal is
8958. The more details like ISSN, Journal Quartile, SJR Score, ISSN, and other important details are provided in the following section.
Important Metrics
| Journal Title | Plasma Chemistry and Plasma Processing |
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| Publisher | Springer New York |
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| ISSN | 02724324, 15728986 |
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| SJR | 0.577 |
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| H-Index | 72 |
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| Country | United States |
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| Quartile | Q2 |
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| Online Submission | Submit |
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Plasma chemistry and plasma processing Impact Score 2024
The latest impact score of Plasma chemistry and plasma processing is 3.77.
Credit & Source: Scopus.